SEL Develops 5,291ppi Micro OLED Display Integrating Si CMOS and OSFET
What They Say OLEDNet.com published an article highlighting that Japan’s Semiconductor Energy Laboratory (SEL) has developed a 5,291 ppi microOLED that it discussed at the recent IMID event. The development is intended to solve two challenges for the architecture: Source/gate drivers are located outside the display area which means a significant bezel width, which is … Read more