Nikon has released two new photolithography tools that can support G10.5 and G11 sized substrates. The machines are available in two versions, the FX-103S with resolution of 3.0μm (g + h + i-line) and the FX-103SH 2.2 μm (g + h + i-line). Alignment accuracy is ± 0.5μm and the TACT time is just 60 seconds/substrate, allowing 480 65″ or 322 75″ panels per hour.
Analyst Comment
We’re not specialists in the equipment side, but it is expected that this system will position Nikon well against Canon. IHS has previously reported that both companies are currently sold out of capacity for 2018. (BR)
