Atomic Layer Deposition for Ultra-Barrier Films
by Raverstead
Lotus Applied Technology presented on its development of “High Speed Low Cost ALD (Atomic Layer Deposition) Ultra-Barrier on Sheets and Rolls”. Eric Dickey of Lotus began his talk by providing a description of the …
Tags:Film materials| Large Display Monitor| Mobile Display Monitor| Vapour Deposition| Vol 21 - Issue 48
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