OLED Info is reporting that Poland-based Ergis, known for its noDiffusion film platform, is working on expanding its production capabilities. The company is shifting from a batch system to a roll-to-roll (R2R) configuration, utilizing two technologies, atomic layer deposition (ALD) and sputtering. While facing delays with ALD technology, Ergis has successfully commercialized sputtering, producing sample rolls of its noDiffusion film. The film has a performance of about 10-4 wtr, making it suitable for high-end OLED display applications and other OLED applications not requiring ultra-long lifetimes. Ergis is currently sending these samples to its customers. Its next goal is to finalize the ALD R&D effort, enabling the creation of cost-competitive, high-performance barrier films (10-6) suitable for standard OLED display applications by the first half of 2024.
What Display Daily Things
While sputtering is a well-established and effective technique for thin film deposition, including barrier films, it does have limitations in terms of its efficacy for large-area or high-volume production of OLEDs and as we have said before, cost is still a factor in quantum dot encapsulation film. ADL is, in general, a challenging and process intensive approach but if Ergis delivers, it should have a compelling approach to meeting the demands of OLED display manufacturers, and get the higher performance that is required.
