Veeco Instruments has announced that Aledia — a developer and manufacturer of 3D LEDs for display applications based on its gallium-nitride-nanowires-on-silicon platform — has selected its Propel GaN MOCVD system to support its R&D.
Aledia says that the tool’s large process window, single-wafer reactor technology and defect stability were factors in its decision to adopt the system.
Designed for GaN applications like power, RF, laser diodes and advanced LEDs, the Propel system’s single-wafer reactor platform is designed to enable the processing of six and eight-inch wafers or two to four-inch wafers in a mini-batch mode.
In addition to Veeco’s proprietary TurboDisc technology, the system also includes the company’s IsoFlange and SymmHeat technologies, intended to provide homogeneous laminar flow and uniform temperature profile across the entire wafer.
Veeco said,
“Innovators in display technology are focusing on the next big technological shifts such as micro-LED and 3D LED. Industry analysts predict a scenario where the market for advanced LED displays could potentially reach 330 million units by 2025. This optimism is fuelled by the promise of sub-100 micrometer LEDs, which is considered the critical enabler to achieving the ultimate display”.
